Research Article · Full Text

Discharge structure of Ar/SF6 inductively coupled plasma at high pressure

Volume 1, Issue 1 September 15, 2025
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Global Open Access Journal of Science Pages: 34–45

Discharge structure of Ar/SF6 inductively coupled plasma at high pressure

1 Key Laboratory of Material Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, 116024, Dalian, China
* Corresponding Author: Shu-Xia Zhao
Journal Global Open Access Journal of Science
Article Type Research Article
Article Topic
Volume / Issue Volume 1, Issue 1
Pages 34–45
Published September 15, 2025

How to Cite

Shu-Xia Zhao. Discharge structure of Ar/SF6 inductively coupled plasma at high pressure. Global Open Access Journal of Science; 1(1):34–45.
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